Pulsed Lased Deposition of Single-Crystalline (001) Oriented Pb(Zr0.5T0.5)O3 Thin Film on PrScO3 Substrate


  • Mahamudu H. Mtebwa Department of Mechanical and Industrial Engineering, University of Dar es Salaam, P.O. Box 35131, Tanzania
  • Nava Setter School of Engineering, Swiss Federal Institute of Technology of Lausanne, CH-1015 Lausanne, Switzerland




PZT, Pulsed Laser Deposition, Epitax, Thin film


High quality thin films are important for domain engineering applications such as on-volatile memory applications. Single crystalline (001) oriented Pb (Zr0.5T0.5)O3 thin films have been grown by pulsed laser deposition on PrScO3 with strontium ruthenate (SRO) electrodes. Thin films were prepared from PZT ceramic targets with 15% excess PbO to compensate for lead loss at high deposition temperature. Layer by layer/step flow growth mode observed on AFM images has been realised by using a single terminated PrScO3 substrate as well as optimized deposition parameters. XRD measurements have confirmed the highly (001) oriented tetragonal symmetry. Furthermore, analysis conducted using piezoresponse force microscopy has shown that the thin films are monodomain with spontaneous ferroelectric polarization preferentially pointing upwards, i.e., away from the substrate. The absence of ferroelastic domains and the observed single ferroelectric domain structure are the results of both relatively small compressive misfit strain as well as favourable electrical boundary conditions.

Keywords:    PZT; Pulsed Laser Deposition; Epitax; Thin film




How to Cite

Mtebwa, M. H. ., & Setter, N. . (2022). Pulsed Lased Deposition of Single-Crystalline (001) Oriented Pb(Zr0.5T0.5)O3 Thin Film on PrScO3 Substrate. Tanzania Journal of Science, 48(3), 528–536. https://doi.org/10.4314/tjs.v48i3.1