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@article{Mussa_Mlyuka_Samiji_2018, title={Hall Effect Parameters of Aluminium and Tungsten Co-Doped VO2 Thin Films}, volume={44}, url={https://tjs.udsm.ac.tz/index.php/tjs/article/view/193}, abstractNote={<p>The Hall Effect parameters of Al and W co-doped VO<sub>2</sub> thin films were studied in order to explain the effect of co-doping on the electrical properties of thermochromic VO<sub>2</sub> films. The carrier concentrations and conductivity of the films were found to increase with increase in temperature while carrier mobility decreased reaching a minimum around the transition temperature then slightly rose and became stable at high temperatures. Tungsten doped films displayed higher carrier concentrations and conductivity on both sides of the metal insulator transition and lower mobility compared to undoped and Al and W co-doped VO<sub>2</sub> thin films.</p> <p><strong>Keywords</strong>: Vanadium dioxide, Hall effect, Career concentration, career mobility</p>}, number={4}, journal={Tanzania Journal of Science}, author={Mussa, Mohamed and Mlyuka, Nuru R and Samiji, Margaret E}, year={2018}, month={Dec.}, pages={100–105} }